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Fracture time predictor in mask data preparation using machine learning 会议论文
会议名称: SPIE Photomask Technology Conference. 会议地点: Monterey, CA. 会议日期: SEP 17-19, 2018
作者:  Calderon, Daniel;  Palma, Diego
收藏  |  浏览/下载：10/0  |  提交时间：2019/12/09
Mask Data Preparation  fracturing process  machine learning  regression  Boolean flows  supervised learning  artificial neural networks  MLP  multilayer perceptron  OASIS  
Fracture time predictor in mask data preparation using machine learning 会议论文
会议名称: SPIE Photomask Technology Conference. 会议地点: Monterey, CA. 会议日期: SEP 17-19, 2018
作者:  Calderon, Daniel;  Palma, Diego
收藏  |  浏览/下载：11/0  |  提交时间：2019/12/09
Mask Data Preparation  fracturing process  machine learning  regression  Boolean flows  supervised learning  artificial neural networks  MLP  multilayer perceptron  OASIS  
Cycle time Reduction by Html Report in Mask Checking Flow 会议论文
会议名称: Photomask Japan 24th Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 05-07, 2017
作者:  Chen, Jian-Cheng;  Lu, Min-Ying;  Fang, Xiang;  Shen, Ming-Feng;  Ma, Shou-Yuan;  Yang, Chuen-Huei;  Tsai, Joe;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh;  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：9/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  mask data correctness check  html report  
Cycle time Reduction by Html Report in Mask Checking Flow 会议论文
会议名称: Photomask Japan 24th Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 05-07, 2017
作者:  Chen, Jian-Cheng;  Lu, Min-Ying;  Fang, Xiang;  Shen, Ming-Feng;  Ma, Shou-Yuan;  Yang, Chuen-Huei;  Tsai, Joe;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh;  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：9/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  mask data correctness check  html report  
Production Mask Composition Checking Flow 会议论文
会议名称: Photomask Japan 23rd Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 06-08, 2016
作者:  Ma, Shou-Yuan (Nick);  Yang, Chuen-Huei;  Tsai, Joe;  Wang, Alice;  Lin, Roger;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh (Jack);  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：7/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  standard verification rule format  
Production Mask Composition Checking Flow 会议论文
会议名称: Photomask Japan 23rd Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 06-08, 2016
作者:  Ma, Shou-Yuan (Nick);  Yang, Chuen-Huei;  Tsai, Joe;  Wang, Alice;  Lin, Roger;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh (Jack);  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：19/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  standard verification rule format  
Mask Design Automation: An Integrated Approach 会议论文
会议名称: SPIE Conference on Photomask Technology held as Part of the 32nd International Symposium on Photomask Technology. 会议地点: Monterey, CA. 会议日期: SEP 10-13, 2012
作者:  Gladhill, Richard;  Buck, Peter;  Wong, Al
收藏  |  浏览/下载：4/0  |  提交时间：2019/12/09
Mask design automation  mask data preparation  workflow  OPC  MRC  GDS  OASIS  
Generating Well-Behaved OASIS Files for Mask Data Processing 会议论文
会议名称: SPIE Conference on Photomask Technology held as Part of the 32nd International Symposium on Photomask Technology. 会议地点: Monterey, CA. 会议日期: SEP 10-13, 2012
作者:  Hung, D.;  Canepa, J. P.;  Kuo, K.;  Jou, J. G.
收藏  |  浏览/下载：5/0  |  提交时间：2019/12/09
mask data preparation  performance  OASIS  distributed processing  file generation  
Mask Design Automation: An Integrated Approach 会议论文
会议名称: SPIE Conference on Photomask Technology held as Part of the 32nd International Symposium on Photomask Technology. 会议地点: Monterey, CA. 会议日期: SEP 10-13, 2012
作者:  Gladhill, Richard;  Buck, Peter;  Wong, Al
收藏  |  浏览/下载：13/0  |  提交时间：2019/12/09
Mask design automation  mask data preparation  workflow  OPC  MRC  GDS  OASIS  
Generating Well-Behaved OASIS Files for Mask Data Processing 会议论文
会议名称: SPIE Conference on Photomask Technology held as Part of the 32nd International Symposium on Photomask Technology. 会议地点: Monterey, CA. 会议日期: SEP 10-13, 2012
作者:  Hung, D.;  Canepa, J. P.;  Kuo, K.;  Jou, J. G.
收藏  |  浏览/下载：17/0  |  提交时间：2019/12/09
mask data preparation  performance  OASIS  distributed processing  file generation