Knowledge Resource Center for Ecological Environment in Arid Area
DOI | 10.1117/12.979350 |
Mask Design Automation: An Integrated Approach | |
Gladhill, Richard1; Buck, Peter1; Wong, Al2 | |
通讯作者 | Gladhill, Richard |
会议名称 | SPIE Conference on Photomask Technology held as Part of the 32nd International Symposium on Photomask Technology |
会议日期 | SEP 10-13, 2012 |
会议地点 | Monterey, CA |
英文摘要 | Mask Design, or the process of assembling, arranging and configuring the pattern data required to make a photomask, has many characteristics that make it appropriate for automation, including a high order of complexity, many steps in the process flow, many parameters to define, and multiple flow variants. Traditionally Mask Design has been performed in several discrete steps, each having its own set of tools, processes, data formats, and parameter sets. These include, for example, Boolean layer extraction, fill pattern generation, biasing, Optical Process Compensation (OPC), frame generation (assembling the patterns relevant to reticle and wafer alignment, automated bar code identification, masking/taping borders, process control monitors and test patterns); fracture (transforming design data formats into mask write tool formats); jobdeck generation (creating the mask write tool instruction set); and Mask Rule Checking (MRC). These separate, and often non-compatible, process flows make integration challenging. Additionally, the frame generation process typically has evolved in complexity ad hoc and is often not performed in a systematic manner that makes it easily adaptable to automation. In this paper we describe a process-of-record driven approach to Mask Design automation. A hierarchical methodology is described that solves the frame generation problem universally, and treats the mask layout as a unified hierarchical structure. This automation provides a framework for combining multiple EDA tools into seamless, integrated, flexible process flows capable of processing OASIS and GDSII files through DRC, Boolean derivations, dummy fill generation, OPC application, frame generation, MRC, as well as other data manipulations, to produce inspection-ready jobdecks and pattern files, metrology guides, and reports required for mask manufacturing. |
英文关键词 | Mask design automation mask data preparation workflow OPC MRC GDS OASIS |
来源出版物 | PHOTOMASK TECHNOLOGY 2012 |
ISSN | 0277-786X |
EISSN | 1996-756X |
出版年 | 2012 |
卷号 | 8522 |
EISBN | 978-0-8194-9260-9 |
出版者 | SPIE-INT SOC OPTICAL ENGINEERING |
类型 | Proceedings Paper |
语种 | 英语 |
国家 | USA |
收录类别 | CPCI-S |
WOS记录号 | WOS:000316638400029 |
WOS类目 | Nanoscience & Nanotechnology ; Optics |
WOS研究方向 | Science & Technology - Other Topics ; Optics |
资源类型 | 会议论文 |
条目标识符 | http://119.78.100.177/qdio/handle/2XILL650/301497 |
作者单位 | 1.Toppan Photomasks Inc, Cornell West Suite 260,1500 NW Bethany Blvd, Beaverton, OR 97006 USA; 2.Toppan Photomasks Inc, Santa Clara, CA 95054 USA |
推荐引用方式 GB/T 7714 | Gladhill, Richard,Buck, Peter,Wong, Al. Mask Design Automation: An Integrated Approach[C]:SPIE-INT SOC OPTICAL ENGINEERING,2012. |
条目包含的文件 | 条目无相关文件。 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。