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Soil Moisture Influence on the FTIR Spectrum of Salt-Affected Soils 期刊论文
发表期刊: REMOTE SENSING. 出版年: 2022, 卷号: 14, 期号: 10
作者:  Le Thi Thu Hien;  Gobin, Anne;  Duong Thi Lim;  Dang Tran Quan;  Nguyen Thi Hue;  Nguyen Ngoc Thang;  Nguyen Thanh Binh;  Vu Thi Kim Dung;  Pham Ha Linh
收藏  |  浏览/下载：20/0  |  提交时间：2024/09/20
soil  salinity  Fourier-transform infrared spectroscopy  FTIR  Vietnam  
Cycle time Reduction by Html Report in Mask Checking Flow 会议论文
会议名称: Photomask Japan 24th Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 05-07, 2017
作者:  Chen, Jian-Cheng;  Lu, Min-Ying;  Fang, Xiang;  Shen, Ming-Feng;  Ma, Shou-Yuan;  Yang, Chuen-Huei;  Tsai, Joe;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh;  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：22/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  mask data correctness check  html report  
Cycle time Reduction by Html Report in Mask Checking Flow 会议论文
会议名称: Photomask Japan 24th Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 05-07, 2017
作者:  Chen, Jian-Cheng;  Lu, Min-Ying;  Fang, Xiang;  Shen, Ming-Feng;  Ma, Shou-Yuan;  Yang, Chuen-Huei;  Tsai, Joe;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh;  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：16/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  mask data correctness check  html report  
Production Mask Composition Checking Flow 会议论文
会议名称: Photomask Japan 23rd Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 06-08, 2016
作者:  Ma, Shou-Yuan (Nick);  Yang, Chuen-Huei;  Tsai, Joe;  Wang, Alice;  Lin, Roger;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh (Jack);  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：17/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  standard verification rule format  
Production Mask Composition Checking Flow 会议论文
会议名称: Photomask Japan 23rd Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 06-08, 2016
作者:  Ma, Shou-Yuan (Nick);  Yang, Chuen-Huei;  Tsai, Joe;  Wang, Alice;  Lin, Roger;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh (Jack);  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：26/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  standard verification rule format