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Cycle time Reduction by Html Report in Mask Checking Flow 会议论文
会议名称: Photomask Japan 24th Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 05-07, 2017
作者:  Chen, Jian-Cheng;  Lu, Min-Ying;  Fang, Xiang;  Shen, Ming-Feng;  Ma, Shou-Yuan;  Yang, Chuen-Huei;  Tsai, Joe;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh;  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：9/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  mask data correctness check  html report  
Cycle time Reduction by Html Report in Mask Checking Flow 会议论文
会议名称: Photomask Japan 24th Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 05-07, 2017
作者:  Chen, Jian-Cheng;  Lu, Min-Ying;  Fang, Xiang;  Shen, Ming-Feng;  Ma, Shou-Yuan;  Yang, Chuen-Huei;  Tsai, Joe;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh;  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：9/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  mask data correctness check  html report  
Production Mask Composition Checking Flow 会议论文
会议名称: Photomask Japan 23rd Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 06-08, 2016
作者:  Ma, Shou-Yuan (Nick);  Yang, Chuen-Huei;  Tsai, Joe;  Wang, Alice;  Lin, Roger;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh (Jack);  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：7/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  standard verification rule format  
Production Mask Composition Checking Flow 会议论文
会议名称: Photomask Japan 23rd Symposium on Photomask and Next-Generation Lithography Mask Technology. 会议地点: Yokohama, JAPAN. 会议日期: APR 06-08, 2016
作者:  Ma, Shou-Yuan (Nick);  Yang, Chuen-Huei;  Tsai, Joe;  Wang, Alice;  Lin, Roger;  Lee, Rachel;  Deng, Erwin;  Lin, Ling-Chieh (Jack);  Liao, Hung-Yueh;  Tsai, Jenny;  Bowhill, Amanda;  Vu, Hien;  Russell, Gordon
收藏  |  浏览/下载：19/0  |  提交时间：2019/12/09
Mask data preparation  mask rule check  standard verification rule format  
Rule-based integration of RNA-Seq analyses tools for identification of novel transcripts 期刊论文
发表期刊: JOURNAL OF BIOINFORMATICS AND COMPUTATIONAL BIOLOGY. 出版年: 2014, 卷号: 12, 期号: 5
作者:  Inamdar, Harshal;  Datta, Avik;  Sunitha, Manjari K.;  Joshi, Rajendra
收藏  |  浏览/下载：1/0  |  提交时间：2019/11/29
RNA-Seq  splice junctions  transcript assembly  novel transcripts  
ISOMORPHIC CITY: A CUSTOMIZABLE FUTURE SCENARIO 会议论文
会议名称: 18th International Conference on Computer-Aided Architectural Design Research in Asia (CAADRIA). 会议地点: Singapore, SINGAPORE. 会议日期: MAY 15-18, 2013
作者:  Dickinson, Susannah;  Gonzalez, David;  Szostek, Kyle
收藏  |  浏览/下载：4/0  |  提交时间：2019/12/09
Collective intelligence  parametric urban design  e-topias  live data  programmable matter  
ISOMORPHIC CITY: A CUSTOMIZABLE FUTURE SCENARIO 会议论文
会议名称: 18th International Conference on Computer-Aided Architectural Design Research in Asia (CAADRIA). 会议地点: Singapore, SINGAPORE. 会议日期: MAY 15-18, 2013
作者:  Dickinson, Susannah;  Gonzalez, David;  Szostek, Kyle
收藏  |  浏览/下载：7/0  |  提交时间：2019/12/09
Collective intelligence  parametric urban design  e-topias  live data  programmable matter  
Investigation of EUV tapeout flow issues, requirements and options for volume manufacturing 会议论文
会议名称: Conference on Extreme Ultraviolet (EUV) Lithography II. 会议地点: San Jose, CA. 会议日期: FEB 28-MAR 03, 2011
作者:  Cobb, Jonathan;  Jang, Sunghoon;  Ser, Junghoon;  Kim, Insung;  Yeap, Johnny;  Lucas, Kevin;  Do, Munhoe;  Kim, Young-Chang
收藏  |  浏览/下载：9/0  |  提交时间：2019/12/09
EUV lithography  EUV OPC flow  OPC TAT  
Investigation of EUV tapeout flow issues, requirements and options for volume manufacturing 会议论文
会议名称: Conference on Extreme Ultraviolet (EUV) Lithography II. 会议地点: San Jose, CA. 会议日期: FEB 28-MAR 03, 2011
作者:  Cobb, Jonathan;  Jang, Sunghoon;  Ser, Junghoon;  Kim, Insung;  Yeap, Johnny;  Lucas, Kevin;  Do, Munhoe;  Kim, Young-Chang
收藏  |  浏览/下载：3/0  |  提交时间：2019/12/09
EUV lithography  EUV OPC flow  OPC TAT  
A Semantic Rule and Event Driven Approach for Agile Decision-Centric Business Process Management (Invited Paper) 会议论文
会议名称: 4th European Conference, ServiceWave 2011. 会议地点: Poznan, POLAND. 会议日期: OCT 26-28, 2011
作者:  Paschke, Adrian
收藏  |  浏览/下载：1/0  |  提交时间：2019/12/09