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Net Tracing and Classification Analysis on E-Beam Die-to-Database Inspection 会议论文
会议名称: 30th Conference on Metrology, Inspection, and Process Control for Microlithography. 会议地点: San Jose, CA. 会议日期: FEB 22-25, 2016
作者:  Gao, Weihong;  Zeng, Xuefeng;  Lin, Peter;  Pan, Yan;  Song, Ho Young;  Hoang Nguyen;  Cai, Na;  Chen, Zhijin;  Zafar, Khurram
收藏  |  浏览/下载：30/0  |  提交时间：2019/12/09
Net Tracing Classification  Die-to-database Inspection  voltage contrast defect  Hotspot inspection  
Net Tracing and Classification Analysis on E-Beam Die-to-Database Inspection 会议论文
会议名称: 30th Conference on Metrology, Inspection, and Process Control for Microlithography. 会议地点: San Jose, CA. 会议日期: FEB 22-25, 2016
作者:  Gao, Weihong;  Zeng, Xuefeng;  Lin, Peter;  Pan, Yan;  Song, Ho Young;  Hoang Nguyen;  Cai, Na;  Chen, Zhijin;  Zafar, Khurram
收藏  |  浏览/下载：17/0  |  提交时间：2019/12/09
Net Tracing Classification  Die-to-database Inspection  voltage contrast defect  Hotspot inspection  
Large Scale Flash Memory System (LSFMS) For Photomask Defect Inspection Machine 会议论文
会议名称: Conference on Photomask and Next-Generation Lithography Mask Technology XVII. 会议地点: Yokohama, JAPAN. 会议日期: APR 13-15, 2010
作者:  Yamamoto, Satoshi;  Pai, Ravi;  Ranade, Manish;  Mondal, Soumen;  Prabhu, Sundeep;  Kurosaki, Gen
收藏  |  浏览/下载：7/0  |  提交时间：2019/12/09
Mask Inspection  Defect Inspection  OASIS. MASK  MALY  Data Preparation  flash memory  SD card  
Large Scale Flash Memory System (LSFMS) For Photomask Defect Inspection Machine 会议论文
会议名称: Conference on Photomask and Next-Generation Lithography Mask Technology XVII. 会议地点: Yokohama, JAPAN. 会议日期: APR 13-15, 2010
作者:  Yamamoto, Satoshi;  Pai, Ravi;  Ranade, Manish;  Mondal, Soumen;  Prabhu, Sundeep;  Kurosaki, Gen
收藏  |  浏览/下载：22/0  |  提交时间：2019/12/09
Mask Inspection  Defect Inspection  OASIS. MASK  MALY  Data Preparation  flash memory  SD card  
DFM for maskmaking: Design-aware flexible mask-defect analysis - art. no. 67300O 会议论文
会议名称: 27th Annual BACUS Symposium on Photomask Technology. 会议地点: Monterey, CA. 会议日期: SEP 18-21, 2007
作者:  Driessen, Frank A. J. M.;  Westra, J.;  Scheffer, M.;  Kawakami, K.;  Tsujimoto, E.;  Yamaji, M.;  Kawashima, T.;  Hayashi, N.
收藏  |  浏览/下载：15/0  |  提交时间：2019/12/07
DFM  criticality awareness  flexible mask repair  defect analysis  defect inspection  reticle manufacturing