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DOI | 10.1117/12.864177 |
Large Scale Flash Memory System (LSFMS) For Photomask Defect Inspection Machine | |
Yamamoto, Satoshi; Pai, Ravi; Ranade, Manish; Mondal, Soumen; Prabhu, Sundeep; Kurosaki, Gen | |
会议名称 | Conference on Photomask and Next-Generation Lithography Mask Technology XVII |
会议日期 | APR 13-15, 2010 |
会议地点 | Yokohama, JAPAN |
英文摘要 | Concept of asynchronous DB defects inspection machine was contrived to the purpose of reducing the price which had large scale flash memory buffer. This memory buffer was located in between reference data rendering computer and scanner; also it was located in scanner and image computer. As first step to make the concept model real, an experimental system was built which had virtual scanner. |
英文关键词 | Mask Inspection Defect Inspection OASIS. MASK MALY Data Preparation flash memory SD card |
来源出版物 | PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII |
ISSN | 0277-786X |
出版年 | 2010 |
卷号 | 7748 |
EISBN | 978-0-8194-8238-9 |
出版者 | SPIE-INT SOC OPTICAL ENGINEERING |
类型 | Proceedings Paper |
语种 | 英语 |
收录类别 | CPCI-S |
WOS记录号 | WOS:000284822300046 |
WOS类目 | Optics ; Physics, Applied |
WOS研究方向 | Optics ; Physics |
资源类型 | 会议论文 |
条目标识符 | http://119.78.100.177/qdio/handle/2XILL650/298818 |
推荐引用方式 GB/T 7714 | Yamamoto, Satoshi,Pai, Ravi,Ranade, Manish,et al. Large Scale Flash Memory System (LSFMS) For Photomask Defect Inspection Machine[C]:SPIE-INT SOC OPTICAL ENGINEERING,2010. |
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