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TRG-OES measurements of electron temperatures during fluorocarbon plasma etching of SiO2 damage test wafers 会议论文
会议名称: 6th International Symposium on Plasma- and Process-Induced Damage (P2ID). 会议地点: MONTEREY, CA. 会议日期: MAY 13-15, 2001
作者:  Schabel, MJ;  Donnelly, VM;  Cheung, KP;  Kornblit, A;  Layadi, N;  Tai, WW
收藏  |  浏览/下载：3/0  |  提交时间：2019/12/07
Trace rare gases optical emission spectroscopy for determination of electron temperatures and species concentrations in chlorine-containing plasmas 会议论文
会议名称: Joint Magneto-Optical Recording International Symposium / International Symposium on Optical Memory 1997 (MORIS/ISOM 97). 会议地点: YAMAGATA, JAPAN. 会议日期: OCT 27-31, 1997
作者:  Donnelly, VM;  Malyshev, MV;  Kornblit, A;  Ciampa, NA;  Colonell, JI;  Lee, JTC
收藏  |  浏览/下载：16/0  |  提交时间：2019/12/07
electron temperature  optical diagnostics  plasma diagnostics  chlorine plasma  etching  
Trace rare gases optical emission spectroscopy for determination of electron temperatures and species concentrations in chlorine-containing plasmas 期刊论文
发表期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 出版年: 1998, 卷号: 37, 期号: 4B, 页码: 2388-2393
作者:  Donnelly, VM;  Malyshev, MV;  Kornblit, A;  Ciampa, NA;  Colonell, JI;  Lee, JTC
收藏  |  浏览/下载：12/0  |  提交时间：2019/11/28
electron temperature  optical diagnostics  plasma diagnostics  chlorine plasma  etching