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DEPLOYMENT OF OASIS IN THE SEMICONDUCTOR INDUSTRY - STATUS, DEPENDENCIES AND OUTLOOK 会议论文
会议名称: 26th European Mask and Lithography Conference. 会议地点: Grenoble, FRANCE. 会议日期: JAN 18-20, 2010
作者:  Davis, Joseph C.;  Schulze, Steffen;  Fu, Sai;  Tong, Yijun
收藏  |  浏览/下载:6/0  |  提交时间:2019/12/09
OASIS  OASIS.MASK  mask data preparation  mask economics  
DEPLOYMENT OF OASIS IN THE SEMICONDUCTOR INDUSTRY - STATUS, DEPENDENCIES AND OUTLOOK 会议论文
会议名称: 26th European Mask and Lithography Conference. 会议地点: Grenoble, FRANCE. 会议日期: JAN 18-20, 2010
作者:  Davis, Joseph C.;  Schulze, Steffen;  Fu, Sai;  Tong, Yijun
收藏  |  浏览/下载:10/0  |  提交时间:2019/12/09
OASIS  OASIS.MASK  mask data preparation  mask economics  
Study of Data I/O Performance on Distributed Disk System in Mask Data Preparation 会议论文
会议名称: Conference on Photomask Technology 2010. 会议地点: Monterey, CA. 会议日期: SEP 13-16, 2010
作者:  Ohara, Shuichiro;  Odaira, Hiroyuki;  Chikanaga, Tomoyuki;  Hamaji, Masakazu;  Yoshioka, Yasuharu
收藏  |  浏览/下载:0/0  |  提交时间:2019/12/09
Mask Data Preparation  NDE  Distributed Processing  Distributed Disk System  
Large Scale Flash Memory System (LSFMS) For Photomask Defect Inspection Machine 会议论文
会议名称: Conference on Photomask and Next-Generation Lithography Mask Technology XVII. 会议地点: Yokohama, JAPAN. 会议日期: APR 13-15, 2010
作者:  Yamamoto, Satoshi;  Pai, Ravi;  Ranade, Manish;  Mondal, Soumen;  Prabhu, Sundeep;  Kurosaki, Gen
收藏  |  浏览/下载:1/0  |  提交时间:2019/12/09
Mask Inspection  Defect Inspection  OASIS. MASK  MALY  Data Preparation  flash memory  SD card  
Study of Data I/O Performance on Distributed Disk System in Mask Data Preparation 会议论文
会议名称: Conference on Photomask Technology 2010. 会议地点: Monterey, CA. 会议日期: SEP 13-16, 2010
作者:  Ohara, Shuichiro;  Odaira, Hiroyuki;  Chikanaga, Tomoyuki;  Hamaji, Masakazu;  Yoshioka, Yasuharu
收藏  |  浏览/下载:0/0  |  提交时间:2019/12/09
Mask Data Preparation  NDE  Distributed Processing  Distributed Disk System  
Large Scale Flash Memory System (LSFMS) For Photomask Defect Inspection Machine 会议论文
会议名称: Conference on Photomask and Next-Generation Lithography Mask Technology XVII. 会议地点: Yokohama, JAPAN. 会议日期: APR 13-15, 2010
作者:  Yamamoto, Satoshi;  Pai, Ravi;  Ranade, Manish;  Mondal, Soumen;  Prabhu, Sundeep;  Kurosaki, Gen
收藏  |  浏览/下载:12/0  |  提交时间:2019/12/09
Mask Inspection  Defect Inspection  OASIS. MASK  MALY  Data Preparation  flash memory  SD card