干旱区生态环境知识资源中心(Arid): Exogenous Silicon Application Improves Chilling Injury Tolerance and Photosynthetic Performance of Citrus

Arid

DOI	10.3390/agronomy14010139
	Exogenous Silicon Application Improves Chilling Injury Tolerance and Photosynthetic Performance of Citrus
	Mvondo-She, Mireille Asanzi; Mashilo, Jacob; Gatabazi, Auges; Ndhlala, Ashwell Rungano; Laing, Mark Delmege; Zhang, Yueqiang
通讯作者	Mvondo-She, MA
来源期刊	AGRONOMY-BASEL
EISSN	2073-4395
出版年	2024
卷号	14 期号:1
英文摘要	Low-temperature stress is an important limiting factor affecting citrus growth and fruit yields. Therefore, increasing citrus cold stress tolerance may enhance the growth, yield, and quality of citrus production in marginal areas. The objective of this study was to determine the efficacy of silicon (Si) fertilizer application on cold-tolerance enhancement in citrus. Two citrus cultivars (Delta and Nules) were subjected to Si fertilization (control, 1000 mg L-1) and cold-stress temperature treatments (control and 0 degrees C for 72 h) using a 2 x 2 x 2 factorial treatment structure with six replications. Leaf gas exchange and chlorophyll fluorescence parameters, such as net photosynthetic rate (A), stomatal conductance (gs), transpiration rate (Tr), internal CO2 concentration (Ci), intrinsic water-use efficiency (iWUE), minimal fluorescence (Fo), maximum fluorescence (Fm), maximum quantum efficiency of PSII primary photochemistry of dark-adapted leaves (Fv/Fm), maximum quantum efficiency of PSII primary photochemistry of dark-/light-adapted leaves (F'v/F'm), electron transport rate (ETR), non-photochemical quenching (NPQ), and the relative measure of electron transport to oxygen molecules (ETR/A), were measured. The application of Si drenching to trees that were subsequently exposed to cold stress reduced gs, Tr, and Ci but improved iWUE and Fo in both cultivars compared to the Si-untreated trees. In addition, specific adaptation mechanisms were found in the two citrus species; NPQ and ETR were improved in Si-treated Valencia trees, while A, Fm, and ETR/A were improved in Clementine trees under chilling stress conditions. The current research findings indicate the potential of Si application to enhance cold stress tolerance in citrus, which can provide a strategy for growing citrus in arid and semi-arid regions that may experience cold stress. Overall, after the application of silicon drenching, the cold-sensitive citrus Valencia cultivar became as cold-tolerant as the cold-tolerant Clementine cultivar.
英文关键词	abiotic stress citrus chlorophyll fluorescence cold tolerance physiological performance
类型	Article
语种	英语
开放获取类型	gold
收录类别	SCI-E
WOS记录号	WOS:001148944500001
WOS关键词	WATER-USE EFFICIENCY ; CHLOROPHYLL FLUORESCENCE ; ELECTRON-TRANSPORT ; STOMATAL CONDUCTANCE ; ENERGY DISSIPATION ; CO2 ASSIMILATION ; PHOTOSYSTEM-II ; PLANTS ; WHEAT ; DROUGHT
WOS类目	Agronomy ; Plant Sciences
WOS研究方向	Agriculture ; Plant Sciences
资源类型	期刊论文
条目标识符	http://119.78.100.177/qdio/handle/2XILL650/402737
推荐引用方式 GB/T 7714	Mvondo-She, Mireille Asanzi,Mashilo, Jacob,Gatabazi, Auges,et al. Exogenous Silicon Application Improves Chilling Injury Tolerance and Photosynthetic Performance of Citrus[J],2024,14(1).
APA	Mvondo-She, Mireille Asanzi,Mashilo, Jacob,Gatabazi, Auges,Ndhlala, Ashwell Rungano,Laing, Mark Delmege,&Zhang, Yueqiang.(2024).Exogenous Silicon Application Improves Chilling Injury Tolerance and Photosynthetic Performance of Citrus.AGRONOMY-BASEL,14(1).
MLA	Mvondo-She, Mireille Asanzi,et al."Exogenous Silicon Application Improves Chilling Injury Tolerance and Photosynthetic Performance of Citrus".AGRONOMY-BASEL 14.1(2024).