Arid
DOI10.30848/PJB2022-2(33)
AMELIORATION OF DETRIMENTAL EFFECTS OF WATER DEFICIT STRESS ON MAIZE BY FOLIAR APPLIED SILICON AND CHITOSAN
Younas, Hafiza Samra; Abid, Muhammad; Ashraf, Muhammad
通讯作者Abid, M (corresponding author),Bahauddin Zakariya Univ, Fac Agr Sci & Technol, Dept Soil Sci, Multan, Punjab, India.
来源期刊PAKISTAN JOURNAL OF BOTANY
ISSN0556-3321
EISSN2070-3368
出版年2022
卷号54期号:2页码:393-400
英文摘要Water deficit stress is the most devastating abiotic stress to limit crop productivity, particularly in regions of semiarid to arid climate. Different strategies have been used to improve plant resistance to water deficit stress, however, addition of organic and inorganic substances might be more effective and environment friendly. Present study investigated the protective role of silicon (Si) and chitosan against water deficit stress effects in maize (Zea mays L.). Experimental plan consisted of two soil moisture levels i.e. well-watered (100% field capacity, FC) and water deficit stress (50% FC), two levels of Si (0 and 2 mM) and two levels of chitosan (0 and 200 mg L-1), and replicated thrice. Foliar application of Si and chitosan was made for three times i.e. 10, 20 and 30 days after germination. Water deficit stress reduced the shoot length by 30%, shoot fresh weight 46%, shoot dry weight 54%, and root length 40%, root fresh weight 54% and root dry weight 74% as compared to well-watered condition. Foliar applied Si and chitosan either alone or in combination stimulated the activities of antioxidant enzymes with a consequent improvement of 30% in chlorophyll-a and 40% in chlorophyll-b, 33% membrane stability index (MSI), 30% relative water content (RWC) and 46% soluble protein with Si+chitosan under water deficit stress compared to well-watered plants without Si+chitosan. In conclusion, foliar application of Si and chitosan was found to be effective for improving plant adaptation to water deficit stress, where maximum improvement was recorded with the integrated use of Si and chitosan.
英文关键词Biochemical traits Chitosan Drought Maize Physiological processes Silicon
类型Article
语种英语
收录类别SCI-E
WOS记录号WOS:000754179200001
WOS关键词PLANT-GROWTH ; OXIDATIVE STRESS ; DROUGHT STRESS ; CROP ; MECHANISMS ; TOLERANCE ; WHEAT ; ACID
WOS类目Plant Sciences
WOS研究方向Plant Sciences
资源类型期刊论文
条目标识符http://119.78.100.177/qdio/handle/2XILL650/376198
作者单位[Younas, Hafiza Samra; Abid, Muhammad; Ashraf, Muhammad] Bahauddin Zakariya Univ, Fac Agr Sci & Technol, Dept Soil Sci, Multan, Punjab, India
推荐引用方式
GB/T 7714
Younas, Hafiza Samra,Abid, Muhammad,Ashraf, Muhammad. AMELIORATION OF DETRIMENTAL EFFECTS OF WATER DEFICIT STRESS ON MAIZE BY FOLIAR APPLIED SILICON AND CHITOSAN[J],2022,54(2):393-400.
APA Younas, Hafiza Samra,Abid, Muhammad,&Ashraf, Muhammad.(2022).AMELIORATION OF DETRIMENTAL EFFECTS OF WATER DEFICIT STRESS ON MAIZE BY FOLIAR APPLIED SILICON AND CHITOSAN.PAKISTAN JOURNAL OF BOTANY,54(2),393-400.
MLA Younas, Hafiza Samra,et al."AMELIORATION OF DETRIMENTAL EFFECTS OF WATER DEFICIT STRESS ON MAIZE BY FOLIAR APPLIED SILICON AND CHITOSAN".PAKISTAN JOURNAL OF BOTANY 54.2(2022):393-400.
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