Arid
Development of N-Type Amorphous and Microcrystalline Hydrogenated Silicon-Oxides (SiOx:H) and Investigation of their Impact as Window Layers on Silicon Heterojunction Solar Cells Device
Aissa, Brahim; Abdallah, Amir A.; Zekri, Atef; Zakaria, Yahya; Kivambe, Maulid M.; Mansour, Said; Cattin, Jean; Haschke, Jan; Boccard, Mathieu; Ballif, Christophe
通讯作者Aissa, B (corresponding author), Hamad bin Khalifa Univ, Qatar Fdn, Qatar Environm & Energy Res Inst, POB 34110, Doha, Qatar.
会议名称IEEE 46th Photovoltaic Specialists Conference (PVSC)
会议日期JUN 16-21, 2019
会议地点Chicago, IL
英文摘要We report on the development of hydrogenated n-type amorphous and microcrystalline silicon oxides ((n)-SiOx:H and (n) mu c-SiOx:H, respectively) by PECVD, and their successful integration as n-window layers for silicon heterojunction (SHJ) solar cells devices. These Si-oxides were investigated by means of microRaman spectroscopy, high-resolution TEM and time of flight SIMS. Comparatively to (n) mu c-SiOx:H, the (n) a-SiOx:H leads globally to an improvement of the photovoltaic performance, except for open circuit voltage which was higher with the microcrystalline oxide -due probably to a reduction of the parasitic absorption-. The associated temperature coefficients were also investigated towards improving their performance in hot desert conditions.
来源出版物2019 IEEE 46TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)
ISSN0160-8371
出版年2019
页码2667-2674
ISBN978-1-7281-0494-2
出版者IEEE
类型Proceedings Paper
语种英语
收录类别CPCI-S
WOS记录号WOS:000542034902116
WOS类目Energy & Fuels ; Engineering, Electrical & Electronic
WOS研究方向Energy & Fuels ; Engineering
资源类型会议论文
条目标识符http://119.78.100.177/qdio/handle/2XILL650/370069
作者单位[Aissa, Brahim; Abdallah, Amir A.; Zekri, Atef; Zakaria, Yahya; Kivambe, Maulid M.; Mansour, Said] Hamad bin Khalifa Univ, Qatar Fdn, Qatar Environm & Energy Res Inst, POB 34110, Doha, Qatar; [Cattin, Jean; Haschke, Jan; Boccard, Mathieu; Ballif, Christophe] Ecole Polytech Fed Lausanne, Inst Microengn, Photovolta & Thin Film Elect Lab PV Lab, Rue Maladiere 71B, CH-2002 Neuchatel, Switzerland
推荐引用方式
GB/T 7714
Aissa, Brahim,Abdallah, Amir A.,Zekri, Atef,et al. Development of N-Type Amorphous and Microcrystalline Hydrogenated Silicon-Oxides (SiOx:H) and Investigation of their Impact as Window Layers on Silicon Heterojunction Solar Cells Device[C]:IEEE,2019:2667-2674.
条目包含的文件
条目无相关文件。
个性服务
推荐该条目
保存到收藏夹
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Aissa, Brahim]的文章
[Abdallah, Amir A.]的文章
[Zekri, Atef]的文章
百度学术
百度学术中相似的文章
[Aissa, Brahim]的文章
[Abdallah, Amir A.]的文章
[Zekri, Atef]的文章
必应学术
必应学术中相似的文章
[Aissa, Brahim]的文章
[Abdallah, Amir A.]的文章
[Zekri, Atef]的文章
相关权益政策
暂无数据
收藏/分享

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。