Arid
DOI10.3390/s21217112
Exponential-Distance Weights for Reducing Grid-like Artifacts in Patch-Based Medical Image Registration
Wu, Liang; Hu, Shunbo; Liu, Changchun
通讯作者Liu, CC (corresponding author), Shandong Univ, Sch Control Sci & Engn, Jinan 250061, Peoples R China. ; Hu, SB (corresponding author), Linyi Univ, Sch Informat Sci & Engn, Linyi 276005, Shandong, Peoples R China.
来源期刊SENSORS
EISSN1424-8220
出版年2021
卷号21期号:21
英文摘要Patch-based medical image registration has been well explored in recent decades. However, the patch fusion process can generate grid-like artifacts along the edge of patches for the following two reasons: firstly, in order to ensure the same size of input and output, zero-padding is used, which causes uncertainty in the edges of the output feature map during the feature extraction process; secondly, the sliding window extraction patch with different strides will result in different degrees of grid-like artifacts. In this paper, we propose an exponential-distance-weighted (EDW) method to remove grid-like artifacts. To consider the uncertainty of predictions near patch edges, we used an exponential function to convert the distance from the point in the overlapping regions to the center point of the patch into a weighting coefficient. This gave lower weights to areas near the patch edges, to decrease the uncertainty predictions. Finally, the dense displacement field was obtained by this EDW weighting method. We used the OASIS-3 dataset to evaluate the performance of our method. The experimental results show that the proposed EDW patch fusion method removed grid-like artifacts and improved the dice similarity coefficient superior to those of several state-of-the-art methods. The proposed fusion method can be used together with any patch-based registration model.

英文关键词patch-based registration overlap distance exponential function
类型Article
语种英语
开放获取类型gold
收录类别SCI-E
WOS记录号WOS:000718520800001
WOS类目Chemistry, Analytical ; Engineering, Electrical & Electronic ; Instruments & Instrumentation
WOS研究方向Chemistry ; Engineering ; Instruments & Instrumentation
资源类型期刊论文
条目标识符http://119.78.100.177/qdio/handle/2XILL650/368211
作者单位[Wu, Liang; Liu, Changchun] Shandong Univ, Sch Control Sci & Engn, Jinan 250061, Peoples R China; [Hu, Shunbo] Linyi Univ, Sch Informat Sci & Engn, Linyi 276005, Shandong, Peoples R China
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GB/T 7714
Wu, Liang,Hu, Shunbo,Liu, Changchun. Exponential-Distance Weights for Reducing Grid-like Artifacts in Patch-Based Medical Image Registration[J],2021,21(21).
APA Wu, Liang,Hu, Shunbo,&Liu, Changchun.(2021).Exponential-Distance Weights for Reducing Grid-like Artifacts in Patch-Based Medical Image Registration.SENSORS,21(21).
MLA Wu, Liang,et al."Exponential-Distance Weights for Reducing Grid-like Artifacts in Patch-Based Medical Image Registration".SENSORS 21.21(2021).
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