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Un-repairable defects cause not only delivery delay but also un-negligible loss cost in Large Size Photo Mask (LSPM) Productions. In order to avoid such loss, Lasertec provides various types of inspection and repair systems.

The Large Size Substrate inspection system LB79 works for qualifying substrates for LSPMs.

In a LSPM maker, the resist coated blanks can be inspected with LIR79i, the In-process Inspection and Repair system. ADI (After Develop Inspection) also can be performed with the same LIR79i as well as Resist Pattern Repairs with the Laser shots and the ink dispensing.

Pattern inspection system LI712 can detect chrome pattern defects down to a 0.35 micrometer range with a die to die and a die to database comparison over a 2 meter size inspection area. Available data base input formats are GDS, OASIS in addition to MEBES.

In addition to the above, large size pellicle handling and inspection system 71PA is combined to the LI712. The inspected pellicle is transferred into and aligned in LI712. The aligned pellicle is attached onto the LSPM. These processes are accomplished without any approach by operators nearby LSPM, which is very important for preventing particles inside the pellicle.

The processes using those Inspection, Resist Repair and Pellicle Handling systems result in an almost Loss Free mask production.

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