干旱区生态环境知识资源中心(Arid): Die-to-database mask inspection with variable sensitivity

Arid

DOI	10.1117/12.793088
	Die-to-database mask inspection with variable sensitivity
	Tsuchiya, Hideo 1; Tokita, Masakazu 1; Nomura, Takehiko 1; Inoue, Tadao 2
通讯作者	Tsuchiya, Hideo
会议名称	Conference on Photomask and Next-Generation Lithography Mask Technology XV
会议日期	APR 16-18, 2008
会议地点	Yokohama, JAPAN
英文关键词	die-to-database inspection review Mask Data Rank design intent OASIS layout analysis
来源出版物	PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV, PTS 1 AND 2
ISSN	0277-786X
出版年	2008
卷号	7028
ISBN	978-0-8194-7243-4
出版者	SPIE-INT SOC OPTICAL ENGINEERING
类型	Proceedings Paper
语种	英语
国家	Japan
收录类别	CPCI-S
WOS记录号	WOS:000259076200077
WOS类目	Engineering, Electrical & Electronic ; Instruments & Instrumentation ; Optics
WOS研究方向	Engineering ; Instruments & Instrumentation ; Optics
资源类型	会议论文
条目标识符	http://119.78.100.177/qdio/handle/2XILL650/297288
作者单位	1.ASET, Mask Design Drawing & Inspect Technol Res Dept Ma, Mask Inspect Equipment Technol Res Lab, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, Japan; 2.Mask Design Data Technol Res Lab, Kanagawa 2350032, Japan
推荐引用方式 GB/T 7714	Tsuchiya, Hideo,Tokita, Masakazu,Nomura, Takehiko,et al. Die-to-database mask inspection with variable sensitivity[C]:SPIE-INT SOC OPTICAL ENGINEERING,2008.