Knowledge Resource Center for Ecological Environment in Arid Area
DOI | 10.1016/j.tsf.2006.11.102 |
Influence of process steps on the performance of microcrystalline silicon thin film transistors | |
Oudwan, Maher; Djeridane, Yassine; Abramov, Alexey; Aventurier, Bemard; Cabarrocas, Pere Roca i; Templier, Francois | |
通讯作者 | Templier, Francois |
会议名称 | 5th Symposium on Thin Films for Large Area Electronics held at the EMRS 2006 Spring Meeting |
会议日期 | JUN, 2006 |
会议地点 | Nice, FRANCE |
英文摘要 | Bottom gate microcrystal line silicon thin film transistors (ttc-Si TFT) have been realized with two types of films: Vc-Si(l) and Vc-Si(2) with crystalline fraction of 80% and close to 100% respectively. On these TFTs we applied two types of passivation (Si?, and resist). pc-Si TFTs with resist as a passivation layer present a low leakage current of about 2.10(- 12) A for V-G = - 10 arid V-D = 0. 1 V an ON to OFF current ratio of 10(6), a threshold voltage of 7 V, a linear mobility of 0. 1 cm 2 V s, and a sub-threshold voltage of 0.9 V/dec. Microcrystalline silicon TFTs with Si?,, as a passivation present a new phenomenon: a parasitic current for negative gate voltage (- 15 V) causes a bump and changes the shape of the subthreshold region. This excess current can be explained by and oxygen contamination at the back interface. (c) 2006 Elsevier B.V All rights reserved. |
英文关键词 | TFT microcrystalline silicon active matrix |
来源出版物 | THIN SOLID FILMS |
ISSN | 0040-6090 |
出版年 | 2007 |
卷号 | 515 |
期号 | 19 |
页码 | 7662-7666 |
出版者 | ELSEVIER SCIENCE SA |
类型 | Article;Proceedings Paper |
语种 | 英语 |
国家 | France |
收录类别 | CPCI-S ; SCI-E |
WOS记录号 | WOS:000249228000059 |
WOS关键词 | GROWTH |
WOS类目 | Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
WOS研究方向 | Materials Science ; Physics |
资源类型 | 会议论文 |
条目标识符 | http://119.78.100.177/qdio/handle/2XILL650/296876 |
作者单位 | (1)CEA, LETI, F-38054 Grenoble, France;(2)LPICM Ecole Polytechn, Phys Interfaces & Couches Minces Lab, UMR 7674, F-91128 Palaiseau, France |
推荐引用方式 GB/T 7714 | Oudwan, Maher,Djeridane, Yassine,Abramov, Alexey,et al. Influence of process steps on the performance of microcrystalline silicon thin film transistors[C]:ELSEVIER SCIENCE SA,2007:7662-7666. |
条目包含的文件 | 条目无相关文件。 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。