Arid
DOI10.1117/12.681802
From GDSII to OASIS: Practical support tools for data processing flow transition
Endo, Masakazu; Nishizawa, Kuninori; Kato, Kokoro
通讯作者Endo, Masakazu
会议名称Conference on Photomask and Next-Generation Lithography Mask Technology XIII
会议日期APR 18-20, 2006
会议地点Yokohama, JAPAN
英文摘要

OASIS format has begun to be accepted in the field of mask data processing gradually. Major EDA venders have announced their support of OASIS format and new versions of EDA tools which can handle with OASIS files have been shipped one by one. Still, there are great difficulties to convert all the data processing flow from old GDSH to new OASIS. One of the major issues is a problem of verification. Since all the tools have not been completely stable and reliable, there should be a method to verify whether the data is converted to OASIS without any problems. In addition to that, the integrity of the OASIS files itself have to be checked.


In general, OASIS has two aspects for the mask industry. One is a role as a new replacement of GDSH. The other is OASIS.VSB, which is a unified format defined for the description of fractured EB data.


SII NanoTechnology has been developing a new software package called SmartOASIS. SmartOASIS provides lots of practical functions to enable easy transition of data processing flow from conventional GDSH or EB formats to OASIS.


来源出版物PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII, PTS 1 AND 2
ISSN0277-786X
出版年2006
卷号6283
ISBN0-8194-6358-2
出版者SPIE-INT SOC OPTICAL ENGINEERING
类型Proceedings Paper
语种英语
国家Japan
收录类别CPCI-S
WOS记录号WOS:000239451500084
WOS关键词FORMAT
WOS类目Optics ; Imaging Science & Photographic Technology
WOS研究方向Optics ; Imaging Science & Photographic Technology
资源类型会议论文
条目标识符http://119.78.100.177/qdio/handle/2XILL650/296125
作者单位SII Nanotechnol Inc, Div Engn, MDP Grp, 563,Takatsuka Shindenn, Matsudo, Chiba 2702222, Japan
推荐引用方式
GB/T 7714
Endo, Masakazu,Nishizawa, Kuninori,Kato, Kokoro. From GDSII to OASIS: Practical support tools for data processing flow transition[C]:SPIE-INT SOC OPTICAL ENGINEERING,2006.
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