干旱区生态环境知识资源中心(Arid): The unified mask data format based on OASIS for VSB EB writers

Arid

DOI	10.1117/12.617423
	The unified mask data format based on OASIS for VSB EB writers
	Suzuki, T; Hirumi, J; Hojyo, Y; Kawase, Y; Sakamoto, S; Kuriyama, K; Narukawa, S; Hoga, M
通讯作者	Suzuki, T
会议名称	Conference on Photomask and Next-Generation Lithography Mask Technology XII
会议日期	APR 13-15, 2005
会议地点	Yokohama, JAPAN
英文摘要	We have developed a unified mask data format named "OASIS.VSB"(1) for Variable-Shaped-Beam (VSB) EB writers. OASIS.VSB is the mask data format based on OASIS (TM 2) released as a successive format to GDSII by SEMI. We have defined restrictions on OASIS for VSB EB writers to input OASIS.VSB data directly to VSB EB writers just like the native EB data. We confirmed there was no large problem in OASIS.VSB as the unified mask data format through the evaluation results. The latest version of OASIS.VSB specification 3 has been disclosed to the public in 2005.
英文关键词	GDSII MDP EB VSB OASIS EDA RET
来源出版物	Photomask and Next-Generation Lithography Mask Technology XII, Pts 1 and 2
ISSN	0277-786X
出版年	2005
卷号	5853
页码	152-159
ISBN	0-8194-5853-8
出版者	SPIE-INT SOC OPTICAL ENGINEERING
类型	Proceedings Paper
语种	英语
国家	Japan
收录类别	CPCI-S
WOS记录号	WOS:000231416300020
WOS类目	Optics ; Imaging Science & Photographic Technology
WOS研究方向	Optics ; Imaging Science & Photographic Technology
资源类型	会议论文
条目标识符	http://119.78.100.177/qdio/handle/2XILL650/295597
作者单位	(1)Semicond Leading Edge Technol Inc, Tsukuba, Ibaraki 3058569, Japan
推荐引用方式 GB/T 7714	Suzuki, T,Hirumi, J,Hojyo, Y,et al. The unified mask data format based on OASIS for VSB EB writers[C]:SPIE-INT SOC OPTICAL ENGINEERING,2005:152-159.