干旱区生态环境知识资源中心(Arid): Evaluation of mask data preparation with OASIS and P10

Arid

DOI	10.1117/12.617151
	Evaluation of mask data preparation with OASIS and P10
	Kuriyama, K; Machiya, Y; Yamasaki, K; Narukawa, S; Hayashi, N
会议名称	Conference on Photomask and Next-Generation Lithography Mask Technology XII
会议日期	APR 13-15, 2005
会议地点	Yokohama, JAPAN
英文摘要	OASIS (Open Artwork System Interchange Standard)(TM) is the new stream format to replace conventional GDSII and has become a SEMI standard 2003. Also, some EDA software tools already support OASIS. OASIS can apply not only layout design field but also photomask industory. OASIS is effective to reduce data volume even if it is a fractured data, therefore it is expected to solve file size explosion problem.
英文关键词	OASIS PIO MDP jobdeck HOTSCOPE
来源出版物	Photomask and Next-Generation Lithography Mask Technology XII, Pts 1 and 2
ISSN	0277-786X
出版年	2005
卷号	5853
页码	626-633
ISBN	0-8194-5853-8
出版者	SPIE-INT SOC OPTICAL ENGINEERING
类型	Proceedings Paper
语种	英语
收录类别	CPCI-S
WOS记录号	WOS:000231416300073
WOS类目	Optics ; Imaging Science & Photographic Technology
WOS研究方向	Optics ; Imaging Science & Photographic Technology
资源类型	会议论文
条目标识符	http://119.78.100.177/qdio/handle/2XILL650/295595
推荐引用方式 GB/T 7714	Kuriyama, K,Machiya, Y,Yamasaki, K,et al. Evaluation of mask data preparation with OASIS and P10[C]:SPIE-INT SOC OPTICAL ENGINEERING,2005:626-633.