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DOI	10.1117/12.617148
	Effectiveness of mask data process using OASIS format
	Tabara, K; Sakurai, M; Makino, S; Itoh, T; Okada, T
通讯作者	Tabara, K
会议名称	Conference on Photomask and Next-Generation Lithography Mask Technology XII
会议日期	APR 13-15, 2005
会议地点	Yokohama, JAPAN
英文摘要	OASIS (TM)(Open Artwork System Interchange Standard) format was investigated for various logic device datas. OASIS format has higher data compressibility than other methods, and its compressibility is independent on the data size. It is very effective in a advanced technology device according to the above-nentioned investigations. In data storage and data handling, applying after OPC processing is quite effective.
英文关键词	OASIS data format GDSII data process processing time handling time
来源出版物	Photomask and Next-Generation Lithography Mask Technology XII, Pts 1 and 2
ISSN	0277-786X
出版年	2005
卷号	5853
页码	619-625
ISBN	0-8194-5853-8
出版者	SPIE-INT SOC OPTICAL ENGINEERING
类型	Proceedings Paper
语种	英语
国家	Japan
收录类别	CPCI-S
WOS记录号	WOS:000231416300072
WOS类目	Optics ; Imaging Science & Photographic Technology
WOS研究方向	Optics ; Imaging Science & Photographic Technology
资源类型	会议论文
条目标识符	http://119.78.100.177/qdio/handle/2XILL650/295594
作者单位	(1)Fujitsu Ltd, Tokyo 1970833, Japan
推荐引用方式 GB/T 7714	Tabara, K,Sakurai, M,Makino, S,et al. Effectiveness of mask data process using OASIS format[C]:SPIE-INT SOC OPTICAL ENGINEERING,2005:619-625.