Knowledge Resource Center for Ecological Environment in Arid Area
DOI | 10.1117/12.557740 |
OASIS - based unification of mask data representation | |
Sahouria, E; Schulze, S | |
通讯作者 | Sahouria, E |
会议名称 | Conference on Photomask and Next-Generation Lithography Mask Technology XI |
会议日期 | APR 14-16, 2004 |
会议地点 | Yokohama, JAPAN |
英文摘要 | The data volumes of individual files used in the manufacture of modern integrated circuits have become unmanageable using current data format specifications. A number of factors contribute to the problem: size, content and complexity of the designs are growing; the application of RET increases the vertex counts; complex data preparation flows post tape-out result in a large number of intermediate representations of the 14 data and assembly steps are introduced for leveling critical parameters. Based on the choices for the mask making equipment the final result of the flow - the mask writer data - varies. While there is a continuous effort to improve the individual performance of the tools that handle the data, is has become apparent that enhancements to the entire flow are necessary to gain efficiency. Two ways are explored in the present study - the elimination of processing overhead and repeated execution of similar functions and the simplification of the data flow by reducing the number of formats involved. OASIS, the new stream format developed under the sponsorship of SEMI, has the necessary features to fullfill this role. The paper will describe the concept of OASIS as a common intermediate format in the mask data preparation flow and illustrate the benefits with experimental results. A concept for a common mask writer format based on OASIS will be proposed. It considers format dependencies for the mask writing performance for different type of mask writing equipment. Different implementation scenarios are discussed. |
英文关键词 | GDSII stream OASIS integrated circuit layout mask making photomask data format variable shaped beam |
来源出版物 | PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI |
ISSN | 0277-786X |
出版年 | 2004 |
卷号 | 5446 |
页码 | 431-438 |
ISBN | 0-8194-5369-2 |
出版者 | SPIE-INT SOC OPTICAL ENGINEERING |
类型 | Proceedings Paper |
语种 | 英语 |
国家 | USA |
收录类别 | CPCI-S |
WOS记录号 | WOS:000224153200047 |
WOS类目 | Optics ; Imaging Science & Photographic Technology |
WOS研究方向 | Optics ; Imaging Science & Photographic Technology |
资源类型 | 会议论文 |
条目标识符 | http://119.78.100.177/qdio/handle/2XILL650/295062 |
作者单位 | (1)Mentor Graph Corp, Wilsonville, OR 97070 USA |
推荐引用方式 GB/T 7714 | Sahouria, E,Schulze, S. OASIS - based unification of mask data representation[C]:SPIE-INT SOC OPTICAL ENGINEERING,2004:431-438. |
条目包含的文件 | 条目无相关文件。 |
个性服务 |
推荐该条目 |
保存到收藏夹 |
导出为Endnote文件 |
谷歌学术 |
谷歌学术中相似的文章 |
[Sahouria, E]的文章 |
[Schulze, S]的文章 |
百度学术 |
百度学术中相似的文章 |
[Sahouria, E]的文章 |
[Schulze, S]的文章 |
必应学术 |
必应学术中相似的文章 |
[Sahouria, E]的文章 |
[Schulze, S]的文章 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。