Arid
DOI10.1117/12.557740
OASIS - based unification of mask data representation
Sahouria, E; Schulze, S
通讯作者Sahouria, E
会议名称Conference on Photomask and Next-Generation Lithography Mask Technology XI
会议日期APR 14-16, 2004
会议地点Yokohama, JAPAN
英文摘要

The data volumes of individual files used in the manufacture of modern integrated circuits have become unmanageable using current data format specifications. A number of factors contribute to the problem: size, content and complexity of the designs are growing; the application of RET increases the vertex counts; complex data preparation flows post tape-out result in a large number of intermediate representations of the 14 data and assembly steps are introduced for leveling critical parameters. Based on the choices for the mask making equipment the final result of the flow - the mask writer data - varies. While there is a continuous effort to improve the individual performance of the tools that handle the data, is has become apparent that enhancements to the entire flow are necessary to gain efficiency. Two ways are explored in the present study - the elimination of processing overhead and repeated execution of similar functions and the simplification of the data flow by reducing the number of formats involved. OASIS, the new stream format developed under the sponsorship of SEMI, has the necessary features to fullfill this role. The paper will describe the concept of OASIS as a common intermediate format in the mask data preparation flow and illustrate the benefits with experimental results. A concept for a common mask writer format based on OASIS will be proposed. It considers format dependencies for the mask writing performance for different type of mask writing equipment. Different implementation scenarios are discussed.


英文关键词GDSII stream OASIS integrated circuit layout mask making photomask data format variable shaped beam
来源出版物PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI
ISSN0277-786X
出版年2004
卷号5446
页码431-438
ISBN0-8194-5369-2
出版者SPIE-INT SOC OPTICAL ENGINEERING
类型Proceedings Paper
语种英语
国家USA
收录类别CPCI-S
WOS记录号WOS:000224153200047
WOS类目Optics ; Imaging Science & Photographic Technology
WOS研究方向Optics ; Imaging Science & Photographic Technology
资源类型会议论文
条目标识符http://119.78.100.177/qdio/handle/2XILL650/295062
作者单位(1)Mentor Graph Corp, Wilsonville, OR 97070 USA
推荐引用方式
GB/T 7714
Sahouria, E,Schulze, S. OASIS - based unification of mask data representation[C]:SPIE-INT SOC OPTICAL ENGINEERING,2004:431-438.
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