干旱区生态环境知识资源中心(Arid): Enhancement of unified mask data formats for EB writers

Arid

DOI	10.1117/12.579130
	Enhancement of unified mask data formats for EB writers
	Suzuki, T; Hirumi, J; Yoshioka, N; Hojyo, Y; Kawase, Y; Sakamoto, S; Kuriyama, K; Narukawa, S; Houga, M
通讯作者	Suzuki, T
会议名称	24th Annual BACUS Symposium on Photomask Technology
会议日期	OCT 14-17, 2004
会议地点	Monterey, CA
英文摘要	We have developed a unified mask data format named "OASIS.NEO1" for Variable-Shaped-Beam (VSB) EB writers as enhancement of unified mask data format named "NEO2". OASIS.NEO is a pattern data format based on OASIS(TM)(3) released as GDSII replacement by SEMI. We have developed OASIS.NEO for practical use of unified mask data formats in mask data preparation (MDP) flow. For practical use, it is necessary to input OASIS.NEO data directly to VSB EB writers just like the native EB data. So we have defined restrictions on OASIS for VSB EB writers referring the restrictions in NEO based on GDSII named "GDSII.NEO4". In this paper we proposed the specification of OASIS.NEO.
英文关键词	MDP data format GDSII NEO MALY VSB OASIS OASIS.NEO
来源出版物	24TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PT 1 AND 2
ISSN	0277-786X
出版年	2004
卷号	5567
页码	1186-1194
ISBN	0-8194-5513-X
出版者	SPIE-INT SOC OPTICAL ENGINEERING
类型	Proceedings Paper
语种	英语
国家	Japan
收录类别	CPCI-S
WOS记录号	WOS:000226467300122
WOS类目	Engineering, Manufacturing ; Engineering, Electrical & Electronic
WOS研究方向	Engineering
资源类型	会议论文
条目标识符	http://119.78.100.177/qdio/handle/2XILL650/294727
作者单位	(1)Semicond Leading Edge Technol Inc, Tsukuba, Ibaraki 3058569, Japan
推荐引用方式 GB/T 7714	Suzuki, T,Hirumi, J,Yoshioka, N,et al. Enhancement of unified mask data formats for EB writers[C]:SPIE-INT SOC OPTICAL ENGINEERING,2004:1186-1194.