Knowledge Resource Center for Ecological Environment in Arid Area
DOI | 10.1117/12.568027 |
OASIS - Progress on implementing the new stream format for containing data size explosion | |
Steffen, SA; Kent, NB; Buck, P | |
通讯作者 | Steffen, SA |
会议名称 | 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents |
会议日期 | JAN 12-14, 2004 |
会议地点 | Dresden, GERMANY |
英文摘要 | The data volumes of individual files used in the manufacture of modern integrated circuits have become unmanageable using existing data formats specifications. The ITRS roadmap indicates that single layer MEBES files in 2004 exceed 200 GB threshold, worst case. OASIS, the new stream format developed under the sponsorship of SEMI, has been approved in the industry-wide voting in June 2003. The new format that on average will reduce the file size by an order of magnitude, enables to streamline data flows and provides increased efficiency in data exchange. The work to implement the new format into software tools is in progress. This paper gives an overview on the new format, reports results on data volume reduction and is a report on the status and benefits the new format can deliver. A data flow relying on OASIS as the input and transfer format is discussed. |
英文关键词 | GDSII stream OASIS integrated circuit layout mask making photomask hierarchical processing |
来源出版物 | 20TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS |
ISSN | 0277-786X |
出版年 | 2004 |
卷号 | 5504 |
页码 | 53-59 |
ISBN | 0-8194-5437-0 |
出版者 | SPIE-INT SOC OPTICAL ENGINEERING |
类型 | Proceedings Paper |
语种 | 英语 |
国家 | USA |
收录类别 | CPCI-S |
WOS记录号 | WOS:000222824400008 |
WOS类目 | Engineering, Manufacturing ; Engineering, Electrical & Electronic |
WOS研究方向 | Engineering |
资源类型 | 会议论文 |
条目标识符 | http://119.78.100.177/qdio/handle/2XILL650/294715 |
作者单位 | (1)Mentor Graphics Corp, Wilsonville, OR 97070 USA |
推荐引用方式 GB/T 7714 | Steffen, SA,Kent, NB,Buck, P. OASIS - Progress on implementing the new stream format for containing data size explosion[C]:SPIE-INT SOC OPTICAL ENGINEERING,2004:53-59. |
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