干旱区生态环境知识资源中心(Arid): Characterization of thin-film multilayers using magnetization curves and modeling of low-angle X-ray diffraction data

Arid

DOI	10.2172/96639
报告编号	UCRL-ID--114972-3
来源ID	OSTI_ID: 96639
	Characterization of thin-film multilayers using magnetization curves and modeling of low-angle X-ray diffraction data
	Lane, M. [Emory & Henry College, VA (United States)]; Chaiken, A.; Michel, R.P. [Lawrence Livermore National Lab., CA (United States)]
英文摘要	We have characterized thin-film multilayers grown by ion-beam sputtering using magnetization curves and modeling of low-angle x-ray diffraction data. In our films, we use ferromagnetic layer = Co, Fe, and NiFe and spacer layer = Si, Ge, FeSi{sub 2}, and CoSi{sub 2}. We have studied the effects of (1) deposition conditions; (2) thickness of layers; (3) different layer materials; and (4) annealing. We find higher magnetization in films grown at 1000V rather than 500V and in films with spacer layers of 50{angstrom} rather than 100{angstrom}. We find higher coercivity in films with cobalt grown on germanium rather than silicon, metal grown on gold underlayers rather than on glass substrates, and when using thinner spacer layers. Finally, modeling reveals that films grown with disilicide layers are more thermally stable than films grown with silicon spacer layers.
出版年	1994
报告类型	Technical Report
语种	英语
国家	美国
来源学科分类	36 MATERIALS SCIENCE ; 66 PHYSICS ; COBALT SILICIDES ; MAGNETIZATION ; IRON SILICIDES ; LAYERS ; ANNEALING ; GLASS ; GERMANIUM ; GOLD ; THIN FILMS ; ELECTRON DENSITY ; MORPHOLOGY ; SPUTTERING
URL	http://www.osti.gov/scitech/servlets/purl/96639
资源类型	科技报告
条目标识符	http://119.78.100.177/qdio/handle/2XILL650/265940
推荐引用方式 GB/T 7714	Lane, M. [Emory & Henry College, VA ,Chaiken, A.,Michel, R.P. [Lawrence Livermore National Lab., CA . Characterization of thin-film multilayers using magnetization curves and modeling of low-angle X-ray diffraction data,1994.