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DOI | 10.1063/1.4902827 |
Charge contribution to patch-charged microparticle adhesion | |
Vallabh, Chaitanya Krishna Prasad; Vahdat, Armin Saeedi; Cetinkaya, Cetin | |
通讯作者 | Cetinkaya, Cetin |
来源期刊 | APPLIED PHYSICS LETTERS
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ISSN | 0003-6951 |
EISSN | 1077-3118 |
出版年 | 2014 |
卷号 | 105期号:21 |
英文摘要 | Microparticle adhesion influenced by electrostatic charge has been a significant research interest for over past three decades or so in a wide spectrum of areas of interest from manufacturing (electrophotography, powder technology, metallurgy, and semi-conductor manufacturing) to natural phenomena (desert sandstorms and northern lights (auroras)). However, over the years, as a result of the strong discrepancies between the experimental adhesion measurements data and theoretical predictions, some key issues regarding the contributors of adhesion forces in charged microparticles and the nature of surface charge distribution still remain unresolved. In the current work, a non-contact ultrasonic approach is presented and employed for understanding the nature of charge distribution on a single microparticle and determining the effect of electrostatic charge on its adhesion in a non-invasive manner. From the vibrational spectra of the charged particle response to the ultrasonic substrate oscillations under various electrostatic loading conditions, three distinct shifting patterns of vibrational (rocking) resonance frequencies are observed for each level of applied substrate surface voltage, implying an un-symmetric force field on the particle, thus depicting non-uniform non-symmetric surface charge distribution on its surface. Also, a simple mathematical model was presented and employed for predicting the equivalent bulk charge on a single microparticle (toner) from resonance frequency shifts. In summary, it is found that the charge levels reported here are consistent with the previously published data, and it is demonstrated that, in a non-invasive manner, non-uniform charge distribution on a single microparticle can be observed and its total charge can be predicted. (C) 2014 AIP Publishing LLC. |
类型 | Article |
语种 | 英语 |
国家 | USA |
收录类别 | SCI-E |
WOS记录号 | WOS:000345639400014 |
WOS关键词 | PARTICLES ; RESISTANCE ; CONTACT |
WOS类目 | Physics, Applied |
WOS研究方向 | Physics |
资源类型 | 期刊论文 |
条目标识符 | http://119.78.100.177/qdio/handle/2XILL650/180734 |
作者单位 | Clarkson Univ, Dept Mech & Aeronaut Engn, Ctr Adv Mat Proc, Photoacoust Res Lab, Potsdam, NY 13699 USA |
推荐引用方式 GB/T 7714 | Vallabh, Chaitanya Krishna Prasad,Vahdat, Armin Saeedi,Cetinkaya, Cetin. Charge contribution to patch-charged microparticle adhesion[J],2014,105(21). |
APA | Vallabh, Chaitanya Krishna Prasad,Vahdat, Armin Saeedi,&Cetinkaya, Cetin.(2014).Charge contribution to patch-charged microparticle adhesion.APPLIED PHYSICS LETTERS,105(21). |
MLA | Vallabh, Chaitanya Krishna Prasad,et al."Charge contribution to patch-charged microparticle adhesion".APPLIED PHYSICS LETTERS 105.21(2014). |
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