Arid
DOI10.1007/s003390050641
Dynamics of the hydrodynamical growth of columns on silicon exposed to ArF excimer-laser irradiation
Sanchez, F; Morenza, JL; Aguiar, R; Delgado, JC; Varela, M
通讯作者Sanchez, F
来源期刊APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN0947-8396
出版年1998
卷号66期号:1页码:83-86
英文摘要

We present new results about the development of the whiskerlike structures that grow on silicon single crystals exposed in air to ArF excimer-laser irradiation. Small depressions appear on the surface after 100-200 laser pulses. With the next pulses, the size of these depressions increases, without change in depth, and new depressions are formed. At the end of this step the non-depressed regions are constricted and form a reticular network with a mesh size of some mu m. With more pulses the material of the network tends to desert the branches and accumulate in the nodes, and discrete hillocks result. The hillocks progressively change their shape until tall columns are formed. Independent of this process, small protuberances appear on flat areas of the irradiated spot, initially in regions far from the center of the spot. These protuberances evolve to mushroom-type shapes, which remain much shorter than the columns.


类型Article
语种英语
国家Spain
收录类别SCI-E
WOS记录号WOS:000072420100012
WOS关键词GERMANIUM
WOS类目Materials Science, Multidisciplinary ; Physics, Applied
WOS研究方向Materials Science ; Physics
资源类型期刊论文
条目标识符http://119.78.100.177/qdio/handle/2XILL650/135340
作者单位(1)Univ Barcelona, Dept Fis Aplicada & Elect, E-08028 Barcelona, Spain
推荐引用方式
GB/T 7714
Sanchez, F,Morenza, JL,Aguiar, R,et al. Dynamics of the hydrodynamical growth of columns on silicon exposed to ArF excimer-laser irradiation[J],1998,66(1):83-86.
APA Sanchez, F,Morenza, JL,Aguiar, R,Delgado, JC,&Varela, M.(1998).Dynamics of the hydrodynamical growth of columns on silicon exposed to ArF excimer-laser irradiation.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,66(1),83-86.
MLA Sanchez, F,et al."Dynamics of the hydrodynamical growth of columns on silicon exposed to ArF excimer-laser irradiation".APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 66.1(1998):83-86.
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